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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes
Pundaleva, Irina, Archie, Chas N., Chalykh, Roman, Lee, JeungWoo, Choi, SeongWoon, Han, WoosungVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.711233
File:
PDF, 236 KB
english, 2007