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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - A study of EUV resist outgassing characteristics using a novel outgas analysis system
Santillan, Julius Joseph, Lin, Qinghuang, Toriumi, Minoru, Itani, ToshiroVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711264
File:
PDF, 302 KB
english, 2007