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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - PAG distribution and acid thermal diffusion study in ultra-thick chemically amplified resist films
Toukhy, Medhat, Lin, Qinghuang, Paunescu, Margareta, Chen, Chunwei, Pawlowski, GeorgVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711621
File:
PDF, 429 KB
english, 2007