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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Single component chemically-amplified resist based on dehalogenation of polymer
Yamamoto, Hiroki, Lin, Qinghuang, Kozawa, Takahiro, Tagawa, Seiichi, Ohmori, Katsumi, Sato, Mitsuru, Komano, HirojiVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711656
File:
PDF, 370 KB
english, 2007