SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Formulated surface conditioners in 50 nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness
Sugiyama, Minoru, Lin, Qinghuang, Sanada, Masakazu, Wang, Suping, Wong, Patrick, Sinkwitz, Stephan, Jaramillo, Jr., Manuel, Parris, GeneVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.712188
File:
PDF, 575 KB
english, 2007