SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Line width measurement below 60 nm using an optical interferometer and artificial neural network
See, Chung W., Archie, Chas N., Smith, Richard J., Somekh, Michael G., Yacoot, AndrewVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712278
File:
PDF, 258 KB
english, 2007