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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Application of carbon nanotube probes in a critical dimension atomic force microscope
Park, B. C., Archie, Chas N., Choi, J., Ahn, S. J., Kim, D-H, Lyou, J., Dixson, R., Orji, N. G., Fu, J., Vorburger, T. V.Volume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712326
File:
PDF, 554 KB
english, 2007