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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Toward 22 nm for unit process development using step and flash imprint lithography
Schmid, Gerard M., Lercel, Michael J., Thompson, Ecron, Stacey, Nick, Resnick, Douglas J., Olynick, Deirdre L., Anderson, Erik H.Volume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.718155
File:
PDF, 2.21 MB
english, 2007