SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control
Kojima, Yosuke, Watanabe, Hidehiro, Shirasaki, Masanori, Chiba, Kazuaki, Tanaka, Tsuyoshi, Inazuki, Yukio, Yoshikawa, Hiroki, Okazaki, Satoshi, Iwase, Kazuya, Ishikawa, Kiichi, Ozawa, KenVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728925
File:
PDF, 656 KB
english, 2007