SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Data exploder for variable shaped beam exposure
Nogatch, John, Watanabe, Hidehiro, Kirsch, Hartmut, Shi, JunVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728946
File:
PDF, 188 KB
english, 2007