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SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - New PEC optimization for the mask fabrication of sub-50nm memory device
Lee, Sanghee, Watanabe, Hidehiro, Ryu, Dongguk, Park, Junghoon, Nam, Dongseok, Kim, Heebom, Kim, Byunggook, Woo, Sanggyun, Cho, HankuVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728988
File:
PDF, 659 KB
english, 2007