SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Modeling of EUV emission and conversion efficiency from laser-produced tin plasmas for nanolithography
Harilal, S. S., Schellenberg, Frank M., MacFarlane, J. J., Golovkin, I. E., Woodruff, P. R., Wang, P.Volume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772716
File:
PDF, 224 KB
english, 2008