SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Porosity characteristics of ultra-low dielectric insulator films directly patterned by nano-imprint lithography
Ro, Hyun Wook, Schellenberg, Frank M., Jones, Ronald L., Peng, Huagen, Lee, Hae-Jeong, Lin, Eric K., Karim, Alamgir, Yoon, Do Y., Gidley, David W., Soles, Christopher L.Volume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.773004
File:
PDF, 435 KB
english, 2008