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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Photomask technology for 32nm node and beyond
Hikichi, Ryugo, Horiuchi, Toshiyuki, Ishii, Hiroyuki, Migita, Hidekazu, Kakehi, Noriko, Shimizu, Mochihiro, Takamizawa, Hideyoshi, Nagano, Tsugumi, Hashimoto, Masahiro, Iwashita, Hiroyuki, Suzuki, TosVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793014
File:
PDF, 6.14 MB
english, 2008