SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Application of two-fluid nozzles for advanced photomask cleaning process
Masui, Kenji, Horiuchi, Toshiyuki, Takemoto, Tetsuo, Otsubo, Kyo, Sakai, Mari, Higaki, Tomotaka, Watanabe, Hidehiro, Kikuchi, Tsutomu, Kurokawa, YoshiakiVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793018
File:
PDF, 1.39 MB
english, 2008