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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - A modified dynamical model of drying process of polymer blend solution coated on a flat substrate
Kagami, Hiroyuki, Horiuchi, ToshiyukiVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793082
File:
PDF, 266 KB
english, 2008