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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - A new approach to the DFM for the metals
Chung, No-Young, Horiuchi, Toshiyuki, Bae, Hee-Sang, Seo, Beum-Seok, Lee, Sung-Ho, Kim, Sung-Il, Lee, Sun-YongVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793121
File:
PDF, 467 KB
english, 2008