SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - The application of EUV lithography for 40nm node DRAM device and beyond
Park, Joo-on, Schellenberg, Frank M., La Fontaine, Bruno M., Koh, Chawon, Goo, Doohoon, Kim, InSung, Park, Changmin, Lee, Jeonghoon, Park, JinHong, Yeo, JeongHo, Choi, Seong-Woon, Park, Chan-hoonVolume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.814001
File:
PDF, 3.43 MB
english, 2009