SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - The analysis of polarization characteristics on 40nm memory devices
Yoo, Minae, Levinson, Harry J., Dusa, Mircea V., Park, Chanha, You, Taejun, Yang, Hyunjo, Min, Young-Hong, Park, Ki-Yeop, Yim, Donggyu, Park, SungkiVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814087
File:
PDF, 467 KB
english, 2009