SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Investigation of phase distribution using Phame® in-die phase measurements
Buttgereit, Ute, Allgair, John A., Raymond, Christopher J., Perlitz, SaschaVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.814132
File:
PDF, 535 KB
english, 2009