SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Evaluation of shadowing and flare effect for EUV tool
Moon, James, Schellenberg, Frank M., La Fontaine, Bruno M., Kim, Cheol-Kyun, Nam, Byoung-Sub, Nam, Byoung-Ho, Hyun, Yoon-Suk, Kim, Suk-Kyun, Lim, Chang-Moon, Kim, Yong-Dae, Kim, Mun-Sik, Choi, Yong-KyVolume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.814364
File:
PDF, 2.64 MB
english, 2009