SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Systematic defect filtering and data analysis methodology for design based metrology
Yang, Hyunjo, Allgair, John A., Raymond, Christopher J., Kim, Jungchan, Lee, Taehyeong, Jung, Areum, Yoo, Gyun, Yim, Donggyu, Park, Sungki, Hasebe, Toshiaki, Yamamoto, Masahiro, Cai, JunVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.814373
File:
PDF, 646 KB
english, 2009