SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Mask-LMC: lithographic simulation and defect detection from high-resolution mask images
Chen, George, Hosono, Kunihiro, Wiley, James N., Wang, Jen-Shiang, Howell, Rafael C., Bai, Shufeng, Chen, Yi-Fan, Chen, Frank, Cao, Yu, Takigawa, Tadahiro, Kurosawa, Terunobu, Tsuchiya, Hideo, Usuda,Volume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824288
File:
PDF, 430 KB
english, 2009