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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Thin absorber EUVL mask with light-shield border for full-field scanner: flatness and image placement change through mask process
Kamo, Takashi, Zurbrick, Larry S., Montgomery, M. Warren, Tanaka, Yuusuke, Tanaka, Toshihiko, Suga, Osamu, Abe, Tsukasa, Takikawa, Tadahiko, Mohri, Hiroshi, Shoki, Tsutomu, Usui, YouichiVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.829873
File:
PDF, 5.18 MB
english, 2009