SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Study on acid diffusion length effect with PAG-blended system and anion-bounded polymer system
Tarutani, Shinji, Allen, Robert D., Tsubaki, Hideaki, Takahashi, Hidenori, Itou, Takayuki, Matsunaga, Kentaro, Shiraishi, Gousuke, Itani, ToshiroVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846033
File:
PDF, 943 KB
english, 2010