SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Mask data rank and printability verification function of mask inspection system
Takahara, Kenichi, Raymond, Christopher J., Tokita, Masakazu, Tsuchiya, Hideo, Yamabe, Masaki, Kikuiri, Nobutaka, Usuda, KinyaVolume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.846412
File:
PDF, 1.31 MB
english, 2010