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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Topography-aware BARC optimization for double patterning
Liu, Shijie, Dusa, Mircea V., Conley, Will, Fühner, Tim, Shao, Feng, Barenbaum, Aliaksandr, Jahn, Johannes, Erdmann, AndreasVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846441
File:
PDF, 3.25 MB
english, 2010