SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Stepwise fitting methodology for optical proximity correction modeling
Isoyan, Artak, Dusa, Mircea V., Conley, Will, Li, Jianliang, Melvin III, Lawrence S.Volume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846635
File:
PDF, 342 KB
english, 2010