![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Process window and integration results for full-chip model-based assist-feature placement at the 32 nm node and below
Li, Ji, Dusa, Mircea V., Conley, Will, Luk-Pat, Gerard, Poonawala, Amyn, Lucas, Kevin, Painter, BenVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.848443
File:
PDF, 2.05 MB
english, 2010