SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California (Sunday 1 August 2010)] Instrumentation, Metrology, and Standards for Nanomanufacturing IV - An overlapping technique to measure the parallelism of surface elements in a large area based on comparison goniometer
Wang, Zhi-shan, Postek, Michael T., Zhao, Yue-jin, Li, Zhuo, Dong, Liquan, Chu, XuhongVolume:
7767
Year:
2010
Language:
english
DOI:
10.1117/12.860077
File:
PDF, 2.83 MB
english, 2010