SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Soft UV-NIL at the 12.5 nm scale
Kreindl, G., Herr, Daniel J. C., Kast, M., Treiblmayr, D., Glinsner, T., Platzgummer, E., Loeschner, H., Joechl, P., Eder-Kapl, S., Nartz, T., Muehlberger, M., Bergmair, I., Boehm, M., Schoeftner, R.Volume:
7970
Year:
2011
Language:
english
DOI:
10.1117/12.870524
File:
PDF, 3.73 MB
english, 2011