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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Relationships between EUV resist outgassing and contamination deposition at Selete
Oizumi, Hiroaki, La Fontaine, Bruno M., Naulleau, Patrick P., Matsumaro, Kazuyuki, Nomura, Satoshi, Santillan, Julius Joseph, Itani, Toshiro, Watanabe, Takeo, Matsuda, Naohiro, Harada, Tetsuo, KinoshiVolume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.878571
File:
PDF, 1.63 MB
english, 2011