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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Optical far field measurements applied to microroughness determination of periodic microelectronic structures
Raymond, Christopher J., Vauselle, Alexandre, Maillot, Philippe, Georges, Gaëlle, Deumié, CaroleVolume:
7971
Year:
2011
Language:
english
DOI:
10.1117/12.879436
File:
PDF, 694 KB
english, 2011