SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - How to minimize CD variation and overlay degradation induced by film stress
Jung, Woo-Yung, Lim, Yong-Hyun, Park, Shin-Ae, Ahn, Sang-Joon, Lee, Ji-Hyun, Yoo, Jung-A, Pyi, Seung-Ho, Kim, Jin-Woong, Starikov, AlexanderVolume:
8324
Year:
2012
Language:
english
DOI:
10.1117/12.916035
File:
PDF, 877 KB
english, 2012