SPIE Proceedings [SPIE 1989 Intl Congress on Optical Science and Engineering - Paris, France (Monday 24 April 1989)] Optical Microlithography and Metrology for Microcircuit Fabrication - Ultra-Precise Mask Metrology - Development And Practical Results Of A New Measuring Machine
Feindt, H., Sofronijevic, D., Lacombat, Michel J., Wittekoek, StefanVolume:
1138
Year:
1989
Language:
english
DOI:
10.1117/12.961756
File:
PDF, 345 KB
english, 1989