SPIE Proceedings [SPIE 1989 Intl Congress on Optical Science and Engineering - Paris, France (Monday 24 April 1989)] Optical Microlithography and Metrology for Microcircuit Fabrication - Principles And Conception Of LCVD Reactors For Photolytic And Pyrolytic Applications In Microelectronics
Rappe, J., Nicodeme, O., Baufay, L., Lacombat, Michel J., Wittekoek, StefanVolume:
1138
Year:
1989
Language:
english
DOI:
10.1117/12.961761
File:
PDF, 81 KB
english, 1989