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SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V - Submicron Mask Repair Using Focused Ion Beam Technology
Yamamoto, Masahiro, Sato, Mitsuyoshi, Kyogoku, Hideaki, Aita, Kazuo, Nakagawa, Yoshitomo, Yasaka, Anto, Takasawa, Ryohji, Hattori, Osamu, Blais, Phillip D.Volume:
632
Year:
1986
Language:
english
DOI:
10.1117/12.963674
File:
PDF, 8.29 MB
english, 1986