SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - Novel MRC algorithms using GPGPU
Kato, Kokoro, Taniguchi, Yoshiyuki, Inoue, Tadao, Kadota, Kazuya, Kato, KokoroVolume:
8441
Year:
2012
Language:
english
DOI:
10.1117/12.970255
File:
PDF, 310 KB
english, 2012