Flux based modeling and simulation of dry etching for...

Journal of Physics Conference Series 2011 / 02 Vol. 276

Flux based modeling and simulation of dry etching for fabrication of silicon deep trench structures

Malik, Rizwan, Shi, Tielin, Tang, Zirong, Liu, Shiyuan
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Volume:
276
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/276/1/012078
Date:
February, 2011
File:
PDF, 535 KB
english, 2011
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