Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
Tarala, V A, Altakhov, A S, Martens, V Ya, Lisitsyn, S VVolume:
652
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/652/1/012034
Date:
November, 2015
File:
PDF, 1.02 MB
english, 2015