SPIE Proceedings [SPIE Microelectronic Manufacturing '95 - Austin, TX (Wednesday 25 October 1995)] Process, Equipment, and Materials Control in Integrated Circuit Manufacturing - Multiresolution pattern detector networks for controlling plasma etch reactors
Allen, Ronald L., Moore, Randy, Whelan, Mike, Sabnis, Anant G., Raaijmakers, Ivo J.Volume:
2637
Year:
1995
Language:
english
DOI:
10.1117/12.221321
File:
PDF, 340 KB
english, 1995