SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - Fine-pitch control in EB lithography for semiconductor laser grating formation
Hisa, Yoshihiro, Minami, Hiroyuki, Shibata, Kimitaka, Takemoto, Akira, Sato, Kazuhiko, Nagahama, Kouki, Otsubo, Mutuyuki, Aiga, Masao, Seeger, David E.Volume:
2723
Year:
1996
Language:
english
DOI:
10.1117/12.240467
File:
PDF, 279 KB
english, 1996