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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Dendrimer-based chemically amplified resists for sub-100-nm lithography
Tully, David C., Trimble, Alexander R., Frechet, Jean M. J., Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388287
File:
PDF, 712 KB
english, 2000