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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - ZrSiON as a material for high-transmittance attenuated PSM
Kanayama, Koichiro, Haraguchi, Takashi, Yamazaki, Tsukasa, Ii, Toshihiro, Matsuo, Tadashi, Fukuhara, Nobuhiko, Saga, Tadashi, Hattori, Yusuke, Ooshima, Takashi, Otaki, Masao, Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438336
File:
PDF, 373 KB
english, 2001