SPIE Proceedings [SPIE Advances in Resist Technology and...

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SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Negative resist systems using acid-catalyzed pinacol rearrangement reaction in a phenolic resin matrix

Uchino, Shou-ichi, Iwayanagi, Takao, Ueno, Takumi, Hayashi, Nobuaki, Ito, Hiroshi
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Volume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46391
File:
PDF, 319 KB
english, 1991
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