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SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - Surface contamination control during plasma etching
Miyatake, Hiroshi, Kawai, K., Fujiwara, Nobuo, Yoneda, Masahiro, Nishioka, K., Abe, Haruhiko, Ranadive, DeepakVolume:
1593
Year:
1992
Language:
english
DOI:
10.1117/12.56914
File:
PDF, 835 KB
english, 1992