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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Application of CM0 resist model to OPC and verification
Granik, Yuri, Flagello, Donis G., Cobb, Nick, Medvedev, DmitryVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656566
File:
PDF, 901 KB
english, 2006