SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - New method to estimate systematic yield caused by lithography manufacturability
Oishi, Hidetoshi, Watanabe, Hidehiro, Oka, Mikio, Tsuchiya, Kensuke, Ogawa, Kazuhisa, Ohnuma, HidetoshiVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728957
File:
PDF, 993 KB
english, 2007