SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHR
Sier, Jean-Paul, Broadbent, William, Yu, PaulVolume:
6792
Year:
2008
Language:
english
DOI:
10.1117/12.798601
File:
PDF, 679 KB
english, 2008