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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Accelerate OPC convergence with new iteration control methodology
Wang, Ching-Heng, Kawahira, Hiroichi, Zurbrick, Larry S., Liu, Qingwei, Zhang, LiguoVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.800598
File:
PDF, 346 KB
english, 2008